Thermal stability of mercaptan terminated self-assembled multilayer films on SiO2 surfaces

The thermal stability of mercaptopropyltrimethoxysilane derived self-assembled multilayer films were investigated as a function of post-deposition anneals in high vacuum for 60 min each

Jay J Senkevich

2002

Scholarcy highlights

  • The thermal stability of mercaptopropyltrimethoxysilane derived self-assembled multilayer films were investigated as a function of post-deposition anneals in high vacuum for 60 min each
  • Mercaptan SAMs are of interest to promote the chemisorption of metal–organics and to improve the wetting, adhesion, structure, and properties of vacuum deposited metals such as copper and palladium
  • Results indicate that the bonding structure changes as a function of anneal temperature
  • Evidence exists for C–S bond scission near 350 °C reducing the amount of the desirable disulfide species present at the surface
  • The increase in contact angles for the films at 375–600 °C is correlated well with the loss of sulfur and carbon from the SAMs making the surface more hydrophobic

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